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26. FABRICATION OF HIGH REFLECTOR MIRROR FOR OPTICAL APPLICATION USING MgF and ZnS by A.M. Bello, D. Dahuwa and M. Buba Volume 53 (November 2019 Issue)
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FABRICATION OF HIGH REFLECTOR MIRROR FOR OPTICAL APPLICATION USING MgF2 and ZnS

A.M. Bello1, D. Dahuwa and M. Buba

SLT Department Federal Polytechnic Bauchi, Bauchi State Nigeria

Physics Department A.S.C.O.E Azare Bauchi State, Nigeria.

SLT Department Federal Polytechnic Mubi, Adamawa State, Nigeria

Abstract

Recently design and fabrication of high reflector mirror using thin film materials is one of the recent technology that can be used in most of the optical industries. Hence, the strategy for creating an artificially stacked multi-layered mirror using Radio Frequency magnetron sputtering methods and deposited it on a glass substrate. In this design zinc sulphide (ZnS) target as high refractive index (n = 2.35) layer and a magnesium fluoride (MgF2) target as the low refractive index (n = 1.38) layer. Furthermore, the microstructures and optical properties of the ZnS/MgF2 multilayer films are also investigated through UV-Vis spectrometer and FESEM imaging. The fabricated filters consist of high and low refractive 10 and 10 alternating layers, which exhibit a reflectance of 100% respectively. The obtained results suggest that these mirrors could be an exceptional choice for next-generation high-reflection mirrors, and polarized interference filters using Nano technology and the materials can also be used to different types of filter. The total thickness of about 924 nm was obtained with minimum ripple

Keywords: fabrication, mirror, refractive index, multi-layer

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