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Home  >  Volume 22 (2012)

Surface Characterisation of Copper Oxide Thin Films Prepared By RF Magnetron Sputtering by Darma T.H. and Taura L.S. Volume 22 (November, 2012), pp 111 – 118
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Abstract

Surface properties of copper oxide thin films prepared at various deposition conditions on glass and silicon wafer substrates by rf magnetron sputtering using copper target in an argon-oxygen gas mixtures were investigated. The films were characterized by Scanning electron microscopy, Atomic force microscopy, X-ray photoelectron spectroscopy, X-ray diffraction studies, Fourier transform infra-red spectroscopy, and optical transmission and reflection measurement. The films were found to be predominantly of the Cu2O phase as indicated by X-ray diffraction studies and FT-IR. The morphology studies reveal films with dense and columnar structure. Surface roughness of 2.1nm – 10.2nm was observed for the films. Optical transmission greater than 60% was observed in the visible region. The presence of CuO phase was confirmed by the XPS. 

Keywords: copper oxides, surface energy, contact angle,  rf magnetron sputtering.

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